Home > Compound List > Product Information
Tetrakis(dimethylamido)hafnium(IV)_Molecular_structure_CAS_19782-68-4)
Click picture or here to close

Tetrakis(dimethylamido)hafnium(IV)

Catalog No. 666610 Name Sigma Aldrich
CAS Number 19782-68-4 Website http://www.sigmaaldrich.com
M. F. C8H24HfN4 Telephone 1-800-521-8956
M. W. 354.79296 Fax
Purity Email
Storage Chembase ID: 78248

SYNONYMS

Title
四(二甲胺基)铪(IV)
IUPAC name
dimethyl[tris(dimethylamino)hafnio]amine
IUPAC Traditional name
dimethyl[tris(dimethylamino)hafnio]amine
Synonyms
Tetrakis(dimethylamino)hafnium(IV)
四(二甲胺基)铪(IV)
TDMAH

DATABASE IDS

MDL Number MFCD01862473
PubChem SID 24884811
CAS Number 19782-68-4

PROPERTIES

Linear Formula [(CH3)2N]4Hf
Apperance low-melting solid
Density 1.098 g/mL at 25 °C
Flash Point 43 °C
Flash Point 109.4 °F
Melting Point 26-29 °C(lit.)
GHS Pictograms GHS02
GHS Pictograms GHS05
GHS Signal Word Danger
GHS Hazard statements H228-H261-H314
European Hazard Symbols Flammable Flammable (F)
European Hazard Symbols Corrosive Corrosive (C)
MSDS Link Download
Personal Protective Equipment Eyeshields, Faceshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
GHS Precautionary statements P210-P231 + P232-P280-P305 + P351 + P338-P310-P422
RID/ADR UN 3396 4.3/PG 2
Risk Statements 11-14-34
Safety Statements 6-26-36/37/39-43-45
Supplemental Hazard Statements Reacts violently with water.
Hazard Class 4.3
UN Number 3396
Packing Group 2
German water hazard class 3

DETAILS

Description (English)
Frequently Asked Questions
Live Chat and Frequently Asked Questions are available for this Product.
Application
Precursor to HfO2 by atomic layer deposition with water.1
General description
Atomic number of base material: 72 Hafnium
Packaging
25 g in ss cylinder
Protocols & Applications
Precursors Packaged for Depositions Systems
Description (简体中文)
Frequently Asked Questions
Live Chat and Frequently Asked Questions are available for this Product.
Application
在使用水进行原子层沉积的过程中作为 HfO2 的前体。1
General description
Atomic number of base material: 72 Hafnium
包装
25 g in ss cylinder
Protocols & Applications
Precursors Packaged for Depositions Systems

REFERENCES