dimethyl[tris(dimethylamino)hafnio]amine

• ChemBase ID: 78248
• Molecular Formular: C8H24HfN4
• Molecular Mass: 354.79296
• Monoisotopic Mass: 356.14664679
• SMILES: [Hf](N(C)C)(N(C)C)(N(C)C)N(C)C
• Canonical SMILES: CN([Hf](N(C)C)(N(C)C)N(C)C)C
• InChI: InChI=1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
• InChIKey: ZYLGGWPMIDHSEZ-UHFFFAOYSA-N

NAMES AND DATABASE IDS

Names

• IUPAC name: dimethyl[tris(dimethylamino)hafnio]amine
• IUPAC Traditional name: dimethyl[tris(dimethylamino)hafnio]amine
• Synonyms: Tetrakis(dimethylamino)hafnium(IV); Tetrakis(dimethylamido)hafnium(IV); TDMAH; Tetrakis(dimethylamino)hafnium(IV) 99.999%; 四(二甲胺基)铪(IV); 四(二甲胺基)铪(IV)

Database IDs

• CAS Number: 19782-68-4
• MDL Number: MFCD01862473
• PubChem SID: 162043034; 24884811; 24869038
• PubChem CID: 140609

CALCULATED PROPERTIES

• H Acceptors: 4
• H Donor: 0
• LogD (pH = 5.5): -5.105744
• LogD (pH = 7.4): -4.1657004
• Log P: -0.8472
• Molar Refractivity: 55.5736 cm^3
• Polarizability: 28.636051 Å^3
• Polar Surface Area: 12.96 Å^2
• Rotatable Bonds: 4
• Lipinski's Rule of Five: true

PROPERTIES

Physical Property

• Apperance: low-melting solid
• Melting Point: 26-29 °C(lit.); 26-29°C
• Flash Point: 109.4 °F; 43 °C; 43°C
• Density: 1.098; 1.098 g/mL at 25 °C

Safety Information

• Storage Warning: Highly Flammable/Corrosive/Store under Argon/Air Sensitive
• European Hazard Symbols: Corrosive (C); Flammable (F)
• UN Number: 3396
• German water hazard class: 3
• Hazard Class: 4.3
• Packing Group: 2
• Risk Statements: 11-14-34
• Safety Statements: 6-26-36/37/39-43-45
• GHS Pictograms: GHS02; GHS05
• GHS Signal Word: Danger
• GHS Hazard statements: H228-H261-H314
• GHS Precautionary statements: P210-P231 + P232-P280-P305 + P351 + P338-P310-P422
• Personal Protective Equipment: Eyeshields, Faceshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
• RID/ADR: UN 3396 4.3/PG 2
• Supplemental Hazard Statements: Reacts violently with water.

Product Information

• Purity: ≥99.99%
• Linear Formula: [(CH3)2N]4Hf

DETAILS

Sigma Aldrich - 455199

Analysis Note
Purity excludes ~2000 ppm Zr.
General description
Please inquire for bulk quantity, pricing, and packaging options.
Packaging
25 g in ampule

Sigma Aldrich - 666610

Frequently Asked Questions
Live Chat and Frequently Asked Questions are available for this Product.
Application
Precursor to HfO2 by atomic layer deposition with water.1
General description
Atomic number of base material: 72 Hafnium
Packaging
25 g in ss cylinder
Protocols & Applications
Precursors Packaged for Depositions Systems