silane

• ChemBase ID: 129457
• Molecular Formular: H4Si
• Molecular Mass: 32.11726
• Monoisotopic Mass: 32.00822666
• SMILES: [SiH4]
• Canonical SMILES: [SiH4]
• InChI: InChI=1S/H4Si/h1H4
• InChIKey: BLRPTPMANUNPDV-UHFFFAOYSA-N

NAMES AND DATABASE IDS

Names

• IUPAC name: silane
• IUPAC Traditional name: silane
• Synonyms: Monosilane; Silicane; Silicon hydride; Silicon tetrahydride; Silane; Silane; Nanode-40; Polydispersed silicon nanowires; Silicon powder, crystalline, APS ≤50nm; Silicon, AAS standard solution, Specpure®, Si 1000 g/ml; Silicon powder, crystalline, -100 mesh; Silicon powder, crystalline/amorphous, typically 1-20 micron; Silicon plate, 12.5mm (0.5in) thick; Silicon plate, 6.35mm (0.25in) thick; Silicon granular, virgin poly fines; Silicon powder, crystalline, -100+325 mesh; Silicon rod, polycrystalline, unpolished, 1.6cm (0.6in) dia; Silicon rod, 2.5cm (0.98in) dia; Silicon plate, 9.5mm (0.37in) thick; Silicon lump, 15cm (5.9in) & down; Silicon rod, 5.08cm (2.0in) dia; Silicon, Oil based standard solution, Specpure®, Si 5000 g/g; Silicon powder, APS 1-5 micron; Silicon slugs, 9.5mm (0.375in) dia x 9.5mm (0.375in) length; Silicon, Oil based standard solution, Specpure®, Si 1000 g/g; Silicon, plasma standard solution, Specpure®, Si 10,000 g/ml; Silicon, plasma standard solution, Specpure®, Si 1000 g/ml; Silicon powder, crystalline, -325 mesh; Silicon powder, crystalline, -100+200 mesh; Silicon sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick; Silicon sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick; Silicon sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick; Silicon sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick; Silicon lump, 0.1-2.5cm (0.04-1.0in); Silicon lump, 10cm (3.9in) & down; 四氢化硅; 硅烷; 硅粉, 结晶, APS ≤50nm; 硅, AAS标准溶液, Specpure®, Si 1000 μg/ml; 硅粉, 晶体, -100目; 硅粉, 晶体, -325目; 硅, 等离子标准溶液, Specpure®, Si 10,000 μg/ml; 硅粉, 晶体/无定形,通常 1-20微米; 硅, 等离子标准溶液, Specpure®, Si 1000 μg/ml; 硅板, 12.5mm (0.5in)厚; 硅板, 6.35mm (0.25in)厚; 硅颗粒, virgin poly fines; 硅粉, 晶体, -100+325目; 硅棒, 多晶, 未抛光, 1.6cm (0.6in) 直径; 硅棒, 2.5cm (0.98in) 直径; 硅板, 9.5mm (0.37in)厚; 硅块, 15cm (5.9in)或更小; 硅棒, 5.08cm (2.0in) 直径; 硅, 油基标准溶液, Specpure®, Si 5000μg/g; 硅粉, APS 1-5微米; 硅柱, 9.5mm (0.375in) 直径 x 9.5mm (0.375in) 长; 硅,油基标准溶液, Specpure®, Si 1000®g/g; 硅,等离子标准溶液, Specpure®, Si 10,000®g/ml; 硅,等离子标准溶液, Specpure®, Si 1000®g/ml; 硅粉,晶体, -325 目; 硅粉, 晶体, -100+200目; 硅溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚; 硅溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.250in) 厚; 硅溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.125in) 厚; 硅溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚; 硅块, 0.1-2.5cm (0.04-1.0in); 硅块, 10cm (3.9in) 或更小

Database IDs

• CAS Number: 7440-21-3; 7803-62-5
• EC Number: 231-714-2; 232-263-4; 231-130-8
• MDL Number: MFCD00011228; MFCD00085311
• PubChem SID: 162223751; 24860199
• PubChem CID: 23953; 5461123
• CHEBI ID: 29389
• Chemspider ID: 22393
• Gmelin ID: 273
• Wikipedia Title: Silane

CALCULATED PROPERTIES

• H Acceptors: 0
• H Donor: 0
• LogD (pH = 5.5): -1.259
• LogD (pH = 7.4): -1.259
• Log P: -1.259
• Molar Refractivity: 3.2 cm^3
• Polarizability: 3.661579 Å^3
• Polar Surface Area: 0.0 Å^2
• Rotatable Bonds: 0
• Lipinski's Rule of Five: true

PROPERTIES

Physical Property

• Solubility: Reacts slowly in water
• Apperance: ~1/4in and down (fm chunks to powder); ≈1.57g/slug; ≈11.43g/cm; ≈14.32g/25x25mm; ≈19.09g/25x25mm; ≈4.68g/cm; ≈47.18g/cm; ≈9.54g/25x25mm; Colourless gas; gas; Liquid; Powder; S.A. 70-100m2/g
• Melting Point: 1410 °C(lit.); -185 °C(lit.); -185°C
• Boiling Point: -112 °C(lit.); -112°C; 2355 °C(lit.)
• Flash Point: 1 °C; 33.8 °F; extremely flammable gas
• Auto Ignition Point: 294 K (21 °C) (~70 °F)
• Density: 1.114 g/mL at 25 °C(lit.); 1.342 g dm^-3; 2.33 g/mL at 25 °C
• Vapor Density: 1.1 (vs air)
• Std enthalpy of formation: 34.31kJ/mol
• Std molar entropy: 204.6 J mol^-1 K^-1
• Resistivity: >1000 Ω-cm; >200 Ω-cm
• Transition Temperature: critical temperature -3.4 °C

Safety Information

• RTECS: VV1400000; VW0400000
• European Hazard Symbols: Corrosive (C); Flammable (F); Highly flammable (F+); X; Irritant (Xi); Harmful (Xn)
• UN Number: 2203; UN1346; UN3264
• German water hazard class: 1; 2
• Hazard Class: 2.1; 4.1; 8
• Packing Group: II; III
• Risk Statements: 11; 12-17-20; 20/21/22-34; 36
• Safety Statements: 26-60; 33; 7/9-23-26-36/37-45; 9-16-33-36/37/39; 9-20-23-26-36/37/39-45-60
• TSCA Listed: 否; 是
• EU Index: Not listed
• GHS Pictograms: GHS02; GHS05; GHS06; GHS07
• GHS Signal Word: Danger
• Main Hazard: Extremely flammable, pyrophoric in air
• NFPA704:
  

  4

  2

  3
• Permissible exposure limit: 5 ppm (ACGIH TLV)
• Explode Limits: 1.37–100%
• GHS Hazard statements: H220-H332; H228-H303; H301-H311-H332-H314-H318; H303; H319-H303; H331-H314-H303-H313
• GHS Precautionary statements: P210; P210-P241-P280-P240-P312-P370+P378A; P260-P301+P310-P303+P361+P353-P305+P351+P338-P361-P405-P501A; P260-P303+P361+P353-P305+P351+P338-P301+P330+P331-P405-P501A; P280-P264-P305+P351+P338-P312-P337+P313; P312
• Personal Protective Equipment: Eyeshields, Faceshields, Gloves, half-mask respirator (US), multi-purpose combination respirator cartridge (US)
• RID/ADR: UN 2203 2.1

Product Information

• Purity: ≥99.99%; ≥99.998%; 98% (metals basis); 98%, Laser synthesized from vapor phase; 98.4% (metals basis); 99.5% (metals basis); 99.9% (metals basis); 99.9985% (metals basis); 99.999% (metals basis); 99.999+% (metals basis); 99.9999% (metals basis)
• Grade: electronic grade; semiconductor grade
• Compostion: Nanowire, >99%
• Impurities: <1 ppm Carbon dioxide (CO2); <1 ppm Carbon monoxide (CO); <1 ppm Chlorosilanes; <1 ppm THC; <1 ppm Trisilane (Si3H8); <1 ppm Water (H2O); <100 ppm Hydrogen (H2); <2 ppm Nitrogen (N2); <2 ppm Siloxanes; <5 ppm Disilane (Si2H6)
• D × L: 40 nm × 1-20 μm
• Linear Formula: SiH4
• Empirical Formula (Hill Notation): Si

DETAILS

Sigma Aldrich - 333891

Application
Silane is used in the deposition of amorphous silicon, epitaxial silicon and silicon based dielectrics. Polycrystalline films can be deposited on silicon wafers and glass substrates via remote plasma chemical vapor deposition (RPCVD) using a SiH4-SiF2-H2 gas mixture.1,2 Silane is used widely as a dopant in the formation of III-IV semiconductor materials.3
Recommended products
Stainless steel regulators Z527416 or Z527424 are recommended.

Sigma Aldrich - 731498

General description
This material can be used in a variety of electronic and optical devices including transistors, photovoltaics, sensors and piezoelectric generators. They can be assembled onto different substrates, such as flexible or transparent ones amongst others.
Packaging
250 mg in glass bottle
Legal Information
Product of Nanosys, Inc.

Sigma Aldrich - 333905

Recommended products
Lecture bottle needle valve Z146951 or Z187224 is recommended