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Atto 635_Molecular_structure_CAS_)
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Atto 635

Catalog No. 08968 Name Sigma Aldrich
CAS Number Website http://www.sigmaaldrich.com
M. F. C28H35ClN2O6 Telephone 1-800-521-8956
M. W. 531.0403 Fax
Purity ≥90% (HPCE) Email
Storage Chembase ID: 157248

SYNONYMS

IUPAC name
1-(3-carboxypropyl)-N,N,2,2,4,11,11-heptamethyl-1,2,9,11-tetrahydro-1-azatetracen-9-iminium perchlorate
IUPAC Traditional name
1-(3-carboxypropyl)-N,N,2,2,4,11,11-heptamethyl-1-azatetracen-9-iminium perchlorate

DATABASE IDS

PubChem SID 24846239
MDL Number MFCD05865406

PROPERTIES

Empirical Formula (Hill Notation) C28H35ClN2O6
Product Line BioReagent
Purity ≥90% (HPCE)
Suitability suitable for fluorescence
Fluorescence λex 635 nm; λem 659 nm in 0.1 M phosphate pH 7.0
MSDS Link Download
Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter
Storage Temperature -20°C
German water hazard class 3

DETAILS

Description (English)
Application
Atto fluorescent labels are designed for high sensitivity applications, including single molecule detection. Atto labels have rigid structures that do not show any cis-trans-isomerization. Thus these labels display exceptional intensity with minimal spectral shift on conjugation.
General description
Atto 635 is a new label with high molecular absorption (120,000) and quantum yield (0.25) as well as sufficient Stokes shift between excitation and emission maximum. This label is optimized for use with diode laser excitation at 635 nm and is characterized by high photostability.
Description (简体中文)
Application
Atto fluorescent labels are designed for high sensitivity applications, including single molecule detection. Atto labels have rigid structures that do not show any cis-trans-isomerization. Thus these labels display exceptional intensity with minimal spectral shift on conjugation.
General description
Atto 635 is a new label with high molecular absorption (120,000) and quantum yield (0.25) as well as sufficient Stokes shift between excitation and emission maximum. This label is optimized for use with diode laser excitation at 635 nm and is characterized by high photostability.

REFERENCES