Trimethylboron

• Catalog No.: 463094
• CAS Number: 593-90-8
• M. F.: C3H9B
• M. W.: 55.91456
• Purity: ≥98.35%

SYNONYMS

• Title: 三甲基硼
• IUPAC name: trimethylborane
• IUPAC Traditional name: trimethylborane

DATABASE IDS

• EC Number: 209-816-3
• CAS Number: 593-90-8
• MDL Number: MFCD00058727
• PubChem SID: 24869894

PROPERTIES

• Grade: electronic grade
• Impurities: <1 ppm Oxygen (O2)
• Impurities: <1.5% Dimethylethylborane [B(CH3)2C2H5]
• Impurities: <10 ppm Carbon dioxide (CO2)
• Impurities: <10 ppm Nitrogen (N2)
• Impurities: <100 ppm Methane (CH4)
• Impurities: <1000 ppm Trimethylamine (TMA)
• Impurities: <50 ppm Hydrogen (H2)
• Linear Formula: B(CH3)3
• Purity: ≥98.35%
• Apperance: gas
• Boiling Point: -20.2 °C(lit.)
• Melting Point: -161.5 °C(lit.)
• GHS Signal Word: Danger
• GHS Hazard statements: H280-H314
• European Hazard Symbols: Flammable (F)
• European Hazard Symbols: Corrosive (C)
• Personal Protective Equipment: Faceshields, Gloves, Goggles, half-mask respirator (US), multi-purpose combination respirator cartridge (US)
• GHS Precautionary statements: P280-P305 + P351 + P338-P310-P410 + P403
• RID/ADR: UN 3160 2.3
• Risk Statements: 17-34
• Safety Statements: 7-23-26-36/37/39-43-45
• Hazard Class: 2.3
• UN Number: 3160
• German water hazard class: 1

DETAILS

Description (English)

Application
Precursor to boron carbide thin films by chemical vapor deposition (CVD).1
Trimethylboron is used as an organometallic precursor for the CVD of boron-carbon containing films and as a boron source in the deposition of borophosphosilicate glass (BPSG).
Packaging
10 g in ss cylinder
Recommended products
Stainless steel regulators Z527416 or Z527424 are recommended.

Description (简体中文)

Application
三甲基硼可作为硼-碳膜化学气相沉积的有机金属前体，以及硼磷硅玻璃 (BPSG) 沉积的硼源。
化学气相沉积 (CVD) 所形成碳化硼薄膜的前体。1
包装
10 g in ss cylinder
Recommended products
建议使用不锈钢调节器 Z527416 或 Z527424。