NAMES AND DATABASE IDS
NAMES AND DATABASE IDS
Names Database IDs
IUPAC name
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IUPAC Traditional name
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Synonyms
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Hexamethyldisilane
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Hexamethyldisilane
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六甲基二硅烷
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CAS Number
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EC Number
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MDL Number
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Beilstein Number
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PubChem SID
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PubChem CID
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Chemspider ID
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Wikipedia Title
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DATA SOURCES
DATA SOURCES
All Sources Commercial Sources Non-commercial Sources
CALCULATED PROPERTIES
CALCULATED PROPERTIES
JChem
H Acceptors
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0
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H Donor
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0
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LogD (pH = 5.5)
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2.7566
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LogD (pH = 7.4)
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2.7566
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Log P
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2.7566
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Molar Refractivity
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34.6806 cm3
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Polarizability
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17.651302 Å3
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Polar Surface Area
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0.0 Å2
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Rotatable Bonds
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1
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Lipinski's Rule of Five
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true
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PROPERTIES
PROPERTIES
Physical Property
Safety Information
Product Information
Bioassay(PubChem)
Apperance
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Colourless liquid
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Melting Point
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12-13°C
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13.85°C (287K)
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9-12 °C(lit.)
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Boiling Point
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112.85°C (386K)
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112-113°C
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112-114 °C(lit.)
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Flash Point
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-1°C(30°F)
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11 °C
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51.8 °F
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Density
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0.715 g/mL at 25 °C(lit.)
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0.721
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715 mg cm-3
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Refractive Index
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1.422
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1.4220
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n20/D 1.422(lit.)
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n20/D 1.423
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Std molar entropy
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255.89 J K-1 mol-1 (at 22.52 °C)
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RTECS
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JM9170000
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European Hazard Symbols
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Flammable (F)
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Irritant (Xi)
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UN Number
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1993
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UN1993
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MSDS Link
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German water hazard class
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2
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Hazard Class
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3
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Packing Group
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2
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II
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Risk Statements
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11-36/37-43
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R11, R36/37, R43
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Safety Statements
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16-23-45
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9-16-23-24-26-33-37
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S16, S23, S45
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TSCA Listed
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是
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GHS Pictograms
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GHS Signal Word
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DANGER
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Danger
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GHS Hazard statements
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225, 319, 334, 335
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H225-H319-H317-H335
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H225-H319-H334-H335
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GHS Precautionary statements
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210, 261, 305+351+338, 342+311
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P210-P241-P303+P361+P353-P305+P351+P338-P405-P501A
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P210-P261-P305 + P351 + P338-P342 + P311
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Personal Protective Equipment
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Eyeshields, Faceshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
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RID/ADR
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UN 1993 3/PG 2
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Purity
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≥97.0% (GC)
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98%
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98+%
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Grade
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purum
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Linear Formula
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(Si(CH3)3)2
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DETAILS
DETAILS
Wikipedia
Sigma Aldrich
Sigma Aldrich -
217069
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Application Silylating reagent for allylic acetates,1 aryl halides,2 and diketones.3 Source material for vapor deposition during silicon carbide growth.4 Source material for vapor deposition during silicon carbide growth. Packaging 5, 10, 50 g in glass bottle |
Sigma Aldrich -
52617
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Other Notes Starting material for a convenient preparation of trimethylsilyl alkali compounds1,2; For the generation of metal-free silyl anion with TASF3 |
REFERENCES
REFERENCES
From Suppliers
Google Scholar
PubMed
Google Books
- • Precursor of TMSLi, TMSNa and TMSK by cleavage with alkyllithiums or alkoxides. Reaction of the metallated derivatives with aryl halides gives aryltrimethylsilanes: J. Org. Chem., 42, 2654 (1977). The anion adds 1,4-to ɑ?-enones to give ?-silyl ketones: J. Org. Chem., 41, 3063 (1976); Tetrahedron Lett., 24, 3497 (1983). The anion may also be used to deoxygenate secondary nitroalkanes (to ketoximes), nitrones (to imines), and heterocyclic N-oxides: J. Org. Chem., 64, 2211 (1999).
- • Also cleaved by TBAF to give the "salt-free" silyl anion, which adds to aldehydes to give, after acid hydrolysis, ɑ-hydroxy silanes: J. Org. Chem., 48, 912 (1983). TBAF also catalyzes the silylation of OH groups under very mild conditions: Tetrahedron Lett., 35, 8413 (1994). See Appendix 4.
- • Couples with aryl, benzyl or allyl halides in the presence of Tetrakis(triphenylphosphine)palladium(0), 10548, to give the corresponding silanes: J. Organomet. Chem., 148, 97 (1978); 225, 331 (1982).
- • Aryl and alkenyl nitriles undergo ipso-silylation-decyanation, catalyzed by Chloro(1,5-cyclooctadiene)rhodium(I) dimer, 10466, to give the corresponding trimethylsiliyl derivatives: J. Am. Chem. Soc., 128, 8152 (2006).
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PATENTS
PATENTS
PubChem Patent
Google Patent