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1450-14-2 molecular structure
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hexamethyldisilane

ChemBase ID: 127685
Molecular Formular: C6H18Si2
Molecular Mass: 146.37812
Monoisotopic Mass: 146.09470364
SMILES and InChIs

SMILES:
C[Si](C)(C)[Si](C)(C)C
Canonical SMILES:
C[Si]([Si](C)(C)C)(C)C
InChI:
InChI=1S/C6H18Si2/c1-7(2,3)8(4,5)6/h1-6H3
InChIKey:
NEXSMEBSBIABKL-UHFFFAOYSA-N

Cite this record

CBID:127685 http://www.chembase.cn/molecule-127685.html

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NAMES AND DATABASE IDS

NAMES AND DATABASE IDS

Names Database IDs
IUPAC name
hexamethyldisilane
IUPAC Traditional name
hexamethyldisilane
Synonyms
Hexamethyldisilane
Hexamethyldisilane
六甲基二硅烷
CAS Number
1450-14-2
EC Number
215-911-0
MDL Number
MFCD00008258
Beilstein Number
1633463
PubChem SID
162222003
24874540
24852990
PubChem CID
74057
Chemspider ID
66675
Wikipedia Title
Hexamethyldisilane

CALCULATED PROPERTIES

CALCULATED PROPERTIES

JChem
H Acceptors H Donor
LogD (pH = 5.5) 2.7566  LogD (pH = 7.4) 2.7566 
Log P 2.7566  Molar Refractivity 34.6806 cm3
Polarizability 17.651302 Å3 Polar Surface Area 0.0 Å2
Rotatable Bonds Lipinski's Rule of Five true 

PROPERTIES

PROPERTIES

Physical Property Safety Information Product Information Bioassay(PubChem)
Apperance
Colourless liquid expand Show data source
Melting Point
12-13°C expand Show data source
13.85°C (287K) expand Show data source
9-12 °C(lit.) expand Show data source
Boiling Point
112.85°C (386K) expand Show data source
112-113°C expand Show data source
112-114 °C(lit.) expand Show data source
Flash Point
-1°C(30°F) expand Show data source
11 °C expand Show data source
51.8 °F expand Show data source
Density
0.715 g/mL at 25 °C(lit.) expand Show data source
0.721 expand Show data source
715 mg cm-3 expand Show data source
Refractive Index
1.422 expand Show data source
1.4220 expand Show data source
n20/D 1.422(lit.) expand Show data source
n20/D 1.423 expand Show data source
Std molar entropy
255.89 J K-1 mol-1 (at 22.52 °C) expand Show data source
RTECS
JM9170000 expand Show data source
European Hazard Symbols
Flammable Flammable (F) expand Show data source
Irritant Irritant (Xi) expand Show data source
UN Number
1993 expand Show data source
UN1993 expand Show data source
MSDS Link
Download expand Show data source
Download expand Show data source
German water hazard class
2 expand Show data source
Hazard Class
3 expand Show data source
Packing Group
2 expand Show data source
II expand Show data source
Risk Statements
11-36/37-43 expand Show data source
R11, R36/37, R43 expand Show data source
Safety Statements
16-23-45 expand Show data source
9-16-23-24-26-33-37 expand Show data source
S16, S23, S45 expand Show data source
TSCA Listed
expand Show data source
GHS Pictograms
GHS exclamation mark expand Show data source
GHS flame expand Show data source
GHS health hazard expand Show data source
GHS02 expand Show data source
GHS07 expand Show data source
GHS08 expand Show data source
GHS Signal Word
DANGER expand Show data source
Danger expand Show data source
GHS Hazard statements
225, 319, 334, 335 expand Show data source
H225-H319-H317-H335 expand Show data source
H225-H319-H334-H335 expand Show data source
GHS Precautionary statements
210, 261, 305+351+338, 342+311 expand Show data source
P210-P241-P303+P361+P353-P305+P351+P338-P405-P501A expand Show data source
P210-P261-P305 + P351 + P338-P342 + P311 expand Show data source
Personal Protective Equipment
Eyeshields, Faceshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter expand Show data source
RID/ADR
UN 1993 3/PG 2 expand Show data source
Purity
≥97.0% (GC) expand Show data source
98% expand Show data source
98+% expand Show data source
Grade
purum expand Show data source
Linear Formula
(Si(CH3)3)2 expand Show data source

DETAILS

DETAILS

Wikipedia Wikipedia Sigma Aldrich Sigma Aldrich
Sigma Aldrich - 217069 external link
Application
Silylating reagent for allylic acetates,1 aryl halides,2 and diketones.3 Source material for vapor deposition during silicon carbide growth.4
Source material for vapor deposition during silicon carbide growth.
Packaging
5, 10, 50 g in glass bottle
Sigma Aldrich - 52617 external link
Other Notes
Starting material for a convenient preparation of trimethylsilyl alkali compounds1,2; For the generation of metal-free silyl anion with TASF3

REFERENCES

REFERENCES

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  • • Precursor of TMSLi, TMSNa and TMSK by cleavage with alkyllithiums or alkoxides. Reaction of the metallated derivatives with aryl halides gives aryltrimethylsilanes: J. Org. Chem., 42, 2654 (1977). The anion adds 1,4-to ɑ?-enones to give ?-silyl ketones: J. Org. Chem., 41, 3063 (1976); Tetrahedron Lett., 24, 3497 (1983). The anion may also be used to deoxygenate secondary nitroalkanes (to ketoximes), nitrones (to imines), and heterocyclic N-oxides: J. Org. Chem., 64, 2211 (1999).
  • • Also cleaved by TBAF to give the "salt-free" silyl anion, which adds to aldehydes to give, after acid hydrolysis, ɑ-hydroxy silanes: J. Org. Chem., 48, 912 (1983). TBAF also catalyzes the silylation of OH groups under very mild conditions: Tetrahedron Lett., 35, 8413 (1994). See Appendix 4.
  • • Couples with aryl, benzyl or allyl halides in the presence of Tetrakis(triphenylphosphine)palladium(0), 10548, to give the corresponding silanes: J. Organomet. Chem., 148, 97 (1978); 225, 331 (1982).
  • • Aryl and alkenyl nitriles undergo ipso-silylation-decyanation, catalyzed by Chloro(1,5-cyclooctadiene)rhodium(I) dimer, 10466, to give the corresponding trimethylsiliyl derivatives: J. Am. Chem. Soc., 128, 8152 (2006).
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PATENTS

PATENTS

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INTERNET

INTERNET

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